Modelling layer-by-layer deposition of metal oxides.
© LPDC / 2018 EPFL
Our paper on layer-by-layer deposition of metal oxides modelling is published in the Journal of Physical Chemistry C! Kris, Chiara, Benjamin and Florent used coarse-grained modelling to simulate the gas and liquid-phase deposition of metal oxides. Thanks to the combination of rule-based deposition actions and molecular dynamics relaxations, we identified the different growth modes for Atomic Layer Deposition (ALD) and Chemical Layer Deposition (CLD), recently developed in our lab.