Nanoscale Issue 7 (2011)
© 2011 EPFL
100 mm dynamic stencils pattern sub-micrometre structures.
Dynamic ste
ncil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. The group of Prof. Jürgen Brugger (LMIS1 - Microsystems Laboratory 1) demonstrate sub-micrometre, two-dimensional patterning at full 100 mm wafer scale, with two examples emphasizing this technique's unique features. Structures having a width-modulated height below a certain aperture size are fabricated by moving the stencil according to a two-dimensional trajectory.